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Plasma Process Technology
Atomic Layer Deposition Systems
Find the best Atomic Layer Deposition System providing excellent uniformity and conformity for ultra-thin pinhole and particle-free films even down to just a few nanometers.
Precise thickness control and uniformity
PEALD System with True Remote CCP Source –
SI PEALD
The SENTECH True Remote CCP Source enables homogenous and conformal coating of sensitive substrates and layers at low temperatures. A high flux of reactive gas species is provided at the sample surface without UV radiation or ion bombardment.
PEALD System for Optical Coatings on Large Substrates – SILAYO
The SENTECH SILAYO is a plasma-enhanced atomic layer deposition (PEALD) system for optical coatings and extends the SENTECH PECVD and ALD product portfolio.
AL Real Time Monitor
The SENTECH
AL Real Time Monitor
is a proven optical diagnostic tool allowing fast process development with ultra-high resolution of single ALD and ALE cycles.
Plasma Process Technology
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Successful Characterisation of Dielectric Layers on SiC for Next-Gen Semiconductor Applications
Explore our latest research and request the full application note.
Wafer-level integration challenges of ALD for 2D materials
Find out about the collaboration between SENTECH and the Ruhr-Universität Bochum (RUB).
Analysing the earth’s heat balance to better understand global warming
The European Space Agency's satellite mission planned for 2027.
The SENTECH “Plasma Process Technology Seminar” 2024
Click here to find out more about the SENTECH Plasma Process Technology Seminar.
The SENTECH Thin Film Metrology Seminar and Workshop
Read the full article to find out more about the seminar.
SENTECH set to expand sales and service offerings in Spain
Welcome to the SENTECH team Izasa Scientific
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