SENTECH presents advances in atomic layer processing at ALPIN 2022

ALPIN-Photo-IMS-IMC-MST-Sentech-FlexTMDSense team

In association with Fraunhofer IMS, Ruhr Universität Bochum (RUB) and Inorganic Materials Chemistry (IMC), the ALPIN Workshop, once again provided an excellent platform for industrial and academic partners, to learn more about Atomic Layer Processes and the latest research results on this constantly developing topic. The Workshop focussed on the current markets for atomic Layer Deposition (ALD) and applications including the Semiconductor industry, MEMS, sensors and optics.

SENTECH Instruments were delighted to co-sponsor and join the event which took place in the Fraunhofer-inHaus-Zentrum in Duisburg from Monday 12.9.22 to Tuesday 13.9.22, to present recent advances in Atomic Layer Processing utilising in situ real-time ellipsometry using the SENTECH SI PEALD and the SI 500 ALE with Real Time Monitor for the complex thin film ALD processes of IGZO and ALE Processes for Al2O3.

The results demonstrated a significant reduction in development time, damage-free etching, extreme selectivity and atomic scale precision with in situ measurements delivering direct information on film growth and real-time measurements revealing the influence of individual process steps. If you would like to find out more information about the SENTECH SI PEALD, SI 500 ALE with Real Time Monitor, or any of the SENTECH Plasma process Technology or Thin Film Metrology range of equipment contact