SENTECH veranstaltet ein anwendungsorientiertes Seminar zum Thema „Ellipsometrie und Reflektometrie zur Qualitätskontrolle dünner Schichten“ in Berlin-Adlershof. Wir freuen uns, dass wir auch dieses Jahr wieder kompetente Referenten gewinnen konnten, die Ihnen an ausgewählten Beispielen die Anwendungsmöglichkeiten der optischen Messtechniken Ellipsometrie und Reflektometrie von SENTECH erläutern werden. →weiter

What's New?


SENTECH, a specialist in plasma etching, plasma deposition, atomic layer deposition and insitu measurement methods, presented the newest results in etching silicon and III-V compounds, in depositing dielectric films for device passivation by ICPECVD, in ALD for optical and high frequency device applications as well as in advanced automation. →read more


SENTECH took part in the world’s largest photovoltaics exhibition “SNEC”, hold from May 28-30 in Shanghai, China. Information were given about the next generation of the SENperc PV, the well-known laser ellipsometer SE 400adv PV as well as on the measurement tool SenSol for large CIGS thin film solar cells.  →read more

Metrology for solar cells on large foils

SENTECH developed the new SenSol R2R measurement system for photovoltaics using large foil as substrate. Film thickness, optical as well as electrical properties of functional coatings can be measured on any position of the 2000 m long foils. For this purpose, transmission, reflection measurements and electrical metrology are applied. Challenging are flexibility and tension of the foil because they result in bulges and wrinkles.→read more

ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

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