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Thin-Film-anaylsis-seminar-2019-by-SENTECH

A SENTECH workshop on Ellipsometry took place in January 9-11, 2019 in Beijing, China. There is an large interest of Chinese scientists and users in SENTECH innovative thin film measurement tools. That’s why SENTECH is organizing application-oriented workshops and seminars in China frequently. This is to update already existing users as well as prospective customers on new metrology applications and their possibilities of use. →read more

ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

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SENTECH
Instruments GmbH

Schwarzschildstr. 2
12489 Berlin
Germany

Phone: +49 (0)30 63 92 55 20
Fax: +49 (0)30 63 92 55 22
Email: info@sentech.de

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German sales office:
SENTECH GmbH

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Chinese sales office:
SENTECH China


Worldwide sales partners:
→ SENTECH Distributor NetworklinkMG