SENTECH Instruments develops, manufactures, and sells worldwide advanced quality instrumentation for Plasma Etching, PECVD, Atomic Layer Deposition, Thin Film Measurement (Spectroscopic Ellipsometry, Spectroscopic Reflectometry and Laser Ellipsometer) and Photovoltaics.

What's New?

Thin-Film-anaylsis-seminar-2019-by-SENTECH

A SENTECH workshop on Ellipsometry took place in January 9-11, 2019 in Beijing, China. There is an large interest of Chinese scientists and users in SENTECH innovative thin film measurement tools. That’s why SENTECH is organizing application-oriented workshops and seminars in China frequently. This is to update already existing users as well as prospective customers on new metrology applications and their possibilities of use. →read more

ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

Upcoming Events:

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SENTECH
Instruments GmbH

Schwarzschildstr. 2
12489 Berlin
Germany

Phone: +49 (0)30 63 92 55 20
Fax: +49 (0)30 63 92 55 22
Email: info@sentech.de

We hire! linkMG
» Service Engineer «
» Software Developer«
»Application Engineer Plasma«
» Control System and Hardware Developer«
Apply here!linkMG



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German sales office:
SENTECH GmbH

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Chinese sales office:
SENTECH China


Worldwide sales partners:
→ SENTECH Distributor NetworklinkMG