What's New?

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SENTECH would like to invite you to the Thin Film Metrology Seminar and Workshop on 29-30 November 2023, to be held at our Berlin-Adlershof Campus. Find out more information. →read more

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The SENTECH Plasma Process Technology Seminar once again took place on 16 March 2023 in Berlin-Adlershof.  Read the full article to find out more about the seminar and all of the topics from this years event.
→read more,

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At the recent GaN Marathon 2022, a workshop designed to present research and the latest results for gallium nitride in microelectronics and optoelectronics, Christian Miersch, PhD student at Fraunhofer IISB, received a “Best Student Presentation Award” based on his talk "Low Damage Etching of Nitride Semiconductors".→read more

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Welcome to the team Isabel Gavalda Velasco and Juan Gabriel Rodriguez from Izasa Scientific, who will be our brand-new distribution team, based in Spain. →read more

ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

Upcoming Events:

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Instruments GmbH

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12489 Berlin

Phone: +49 (0)30 63 92 55 20
Fax: +49 (0)30 63 92 55 22
Email: info@sentech.de

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