What's New?

Plasma_Seminar_2023_Main article

The SENTECH Plasma Process Technology Seminar once again took place on 16 March 2023 in Berlin-Adlershof.  Read the full article to find out more about the seminar and all of the topics from this years event.
→read more,

Optirefs

Find out more information regarding the collaboration between SENTECH Instruments GmbH, Technische Universität Berlin (TU B), Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (HZB), and Physikalisch Technische Bundesanstalt (PTB) for a joint project, funded by Investitionsbank Berlin as part of the ProFIT program funding. →read more

Best_Student_ Presentation_Award_Thumb

At the recent GaN Marathon 2022, a workshop designed to present research and the latest results for gallium nitride in microelectronics and optoelectronics, Christian Miersch, PhD student at Fraunhofer IISB, received a “Best Student Presentation Award” based on his talk "Low Damage Etching of Nitride Semiconductors".→read more

ACMIN_Thin-Film_ Metrology_ Seminar_2023_small

SENTECH is delighted to be supporting this year’s Thin Film Metrology Seminar in association with Labsoft on 13-14 June 2023, to be held in ACMIN AGH, Cracow, Poland. Find out more information and how to register. →read more

ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

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