ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

Upcoming Events:

Headbanner_SEMICON_Europe

Whats New?

Dutch universities opt for SENTECH service and flexibility

ICP RIE Plasma Etcher

The Technical University Eindhoven as well as the University of Groningen are convinced of SENTECH`s excellent service and the high flexibility of SENTECH plasma systems. Plasma systems SI 500 ICP RIE were purchased with 6 and 5 gas lines, respectively, to cover a variety of applications... →read more

Application-oriented thin film measurement seminar

Thin film measurement SeminarSENTECH as a worldwide leader in thin film measurement and plasma process technology organizes application oriented seminars on a regular basis. The most recent seminar “Ellipsometry and Reflectometry for characterizing thin films” was on thin film measurement. →read more

Quote-Button

SENTECH
Instruments GmbH

Schwarzschildstr. 2
12489 Berlin
Germany

Phone: +49 (0)30 63 92 55 20
Fax: +49 (0)30 63 92 55 22
Email: info@sentech.de



Dtl_100px

German sales office:
SENTECH GmbH

China_100px

Chinese sales office:
SENTECH China


Worldwide sales partners:
→ SENTECH Distributor NetworklinkMG