What's New?

Spectroscopic-Ellipsometer-SENresearch-4.0

The SENresearch 4.0 is an innovative ellipsometry solution which features widest spectral ranges and highest spectral resolution. The Step Scan Analyser (SSA) principle is applied for ellipsometric measurement. The extension of the SSA principle by the innovative 2C design allows measuring the full Mueller matrix. SENresearch 4.0 comes with SpectraRay/4, the new comprehensive ellipsometry software for advanced material analysis. →read more

SENTECH_Plasma Seminar 2016

SENTECH has organized a seminar on “Plasma Process Technology” held at SENTECH Instruments in Berlin on April 07, 2016. The seminar was fully booked and more than 50 process engineers, scientists and application specialists took part. This year the presentations of the seminar centered on etching of silicon nanowires, etching of diamond nano-structures, and etching of fused silica, glass, and technical glass as well as silicon. →read more

ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

Upcoming Events:

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Headbanner_SEMICON_Russia_2016

Headbanner_Intersolar_2016

Headbanner_ICCG11_2016

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SENTECH
Instruments GmbH

Schwarzschildstr. 2
12489 Berlin
Germany

Phone: +49 (0)30 63 92 55 20
Fax: +49 (0)30 63 92 55 22
Email: info@sentech.de


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Application Specialist 
Application Engineer
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German sales office:
SENTECH GmbH

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Chinese sales office:
SENTECH China


Worldwide sales partners:
→ SENTECH Distributor NetworklinkMG