What's New?

SENresearch_Spectralbereiche

To fulfil the high requirements of our customers SENTECH improved the SENresearch FTIR ellipsometer to measure faster in the NIR, offering highest spectral resolution and widest spectral range with excellent signal-to-noise-ratio in shorter measurement time... →read more

Ellipsometry_Reflectometry_Seminar_2015(2)

A one day seminar on the topic “Ellipsometry and Reflectometry for the characterization of thin films” was organized by SENTECH in Stuttgart, June 18, 2015. The seminar was focussed on innovations of SENTECH metrology as well as on new developments in science and technology. Invited speakers and SENTECH experts addressed topics from in situ process control, over nanotechnology to photovoltaics. →read more

ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

Upcoming Events:

Headbanner_JASIS_2015

Headbanner_SEMICON_Taiwan_2015

Headbanner_Fotonik_2015

Headbanner_PVSEC_2015

Quote-Button

SENTECH
Instruments GmbH

Schwarzschildstr. 2
12489 Berlin
Germany

Phone: +49 (0)30 63 92 55 20
Fax: +49 (0)30 63 92 55 22
Email: info@sentech.de


We Are Hiring!
Constructing engineer 
Apply here!



Dtl_100px

German sales office:
SENTECH GmbH

China_100px

Chinese sales office:
SENTECH China


Worldwide sales partners:
→ SENTECH Distributor NetworklinkMG