Upcoming Events:

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ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

What's New?

SEMICON-Europa-2014

With more than 6000 visitors the SEMICON Europa 2014 was the ideal place to introduce SENTECH’s latest development on the field of atomic layer deposition (ALD) – the new ALD Real Time Monitor. →read more

SEM-images-of-Ag-nanoparticles_optimized

Optimizing atomic layer deposition processes with SENTECHs newly launched ALD Real Time Monitor was introduced to the German nanotechnology society. This innovative tool features in situ measurement with 40 ms time resolution...→read more

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SENTECH
Instruments GmbH

Schwarzschildstr. 2
12489 Berlin
Germany

Phone: +49 (0)30 63 92 55 20
Fax: +49 (0)30 63 92 55 22
Email: info@sentech.de



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German sales office:
SENTECH GmbH

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Chinese sales office:
SENTECH China


Worldwide sales partners:
→ SENTECH Distributor NetworklinkMG