Upcoming Events:

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ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

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The Chinese ambassador in Germany, His Excellency Shi Mingde visited SENTECH Instruments GmbH on Friday, 10th of March 2015. He was welcomed by Dr Albrecht Krüger, CEO of SENTECH, who introduced the company and its business fields thin film metrology and plasma process technology. →read more

SEMICON_China_2015

During SEMICON China 2015, the Chinese SENTECH user community and guests met at the representative SENTECH stand and at the SENTECH Plasma Seminar. The introduction of new SENTECH plasma etch and deposition products to the Chinese market and networking were the highlights of the seminar. →read more

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SENTECH
Instruments GmbH

Schwarzschildstr. 2
12489 Berlin
Germany

Phone: +49 (0)30 63 92 55 20
Fax: +49 (0)30 63 92 55 22
Email: info@sentech.de


We Are Hiring!
Employee in Plasma Application 
Apply here!



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German sales office:
SENTECH GmbH

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Chinese sales office:
SENTECH China


Worldwide sales partners:
→ SENTECH Distributor NetworklinkMG