In situ monitoring ALD Real Time Monitor
Benefits of the ALD Real Time Monitor:
Efficient process development and optimization
ALD processes are quickly and easily developed and optimized using single ALD cycles. The ALD Real Time Monitor reveals adsorption and desorption with ultra-high, 40ms time resolution. Developing time, substrates, precursors, and gasses are saved.
ALD processing becomes more efficient after optimization with the ALD Real Time Monitor. Precursor and processing time is saved.
When the precursor supply is running out, this is immediately indicated by a change in growth per cycle detected by the ALD Real Time Monitor.
The SENTECH ALD Real Time Monitor is a novel optical diagnostic tool allowing ultra-high resolution of single ALD cycles
In situ monitoring of adsorption and desorption during ALD cycles. Analysing of film properties (growth rate, thickness, refractive index) without breaking the vacuum, developing new processes in short time, and studying reaction mechanisms during ALD cycles in real time are main applications of SENTECH ALD Real Time Monitor.
The innovative ALD Real Time Monitor is especially designed for fast and efficient process development and optimization with SENTECH Atomic layer deposition systems. One software enables easy operation of SENTECH ALD systems and ALD Real Time Monitor. The ALD Real Time Monitor is fully integrated into SENTECH ALD systems software ensuring easy operation.