RIE plasma etcher Etchlab 200

Etchlab200

Cost-effectiveness

RIE plasma etcher Etchlab 200 combines parallel plate plasma source design with direct load.

Upgradeability

According to its modular design, the plasma etcher Etchlab 200 is upgradeable with larger pumping unit, vacuum loadlock, and additional gas lines.

SENTECH control software

This plasma etcher is equipped with a user-friendly powerful software with mimic GUI, parameter window, recipe editor, data logging, user management.
 

The Etchlab 200 RIE plasma etcher represents a family of direct load plasma etcher combining the advantages of a parallel plate electrode design for RIE with the cost effective design of direct load. The Etchlab 200 features simple and fast sample loading from parts to 200 mm or 300 mm diameter wafer directly onto the electrode or on carrier. Flexibility, modularity, and a small footprint are design characteristics of the Etchlab 200. Large diagnostic windows located at the top electrode and the reactor can easily accommodate the SENTECH laser interferometer or OES and RGA  systems. Ellipsometer ports are available for process monitoring using SENTECH insitu ellipsometers.

The Etchlab 200 plasma etcher can be configured for processing of materials that are compatible with wafer direct loading, including but not limited to silicon and silicon compounds, compound semiconductors, dielectrics, and metals.

The Etchlab 200 is operated by the advanced SENTECH control software using remote field bus technology and a very user-friendly general user interface.

Etchlab_loadlockEtchlab200-300Etchab_SoftwareEtchlab_microstructuresEtchlab_anisotropicEtchlab_CHF3-H2chemistryEtchlab_microfluid

Etchlab200

  • RIE plasma etcher
  • Open lid
  • For up to 200 mm wafers
  • Diagnostic windows for laser interferometer and OES
  • Ellipsometer ports optionally available

Etchlab_loadlock

  • RIE etcher with loadlock
  • For 4 inch up to 8 inch wafers
  • Carriers for pieces and smaller wafers
  • Chlorine etching chemistry
  • Larger pumping unit

Etchlab200-300

  • RIE plasma etcher
  • Open lid
  • For up to 300 mm wafers
  • Diagnostic windows for laser interferometer and OES

Documents   To get more information, please click here.

Documents   To get more information, please click here.