Laser Ellipsometer

SE400

The laser ellipsometer SE 400adv measures thickness and refractive index of transparent thin films, featuring measurement speed, Sub-Angstrom precision in thickness, and per mille accuracy in refractive index determination. Multiple angle measurements allow the characterization of absorbing films using the laser ellipsometer SE 400adv. Details for SE 400adv here!

SE500

The CER ellipsometer SE 500adv combines a laser ellipsometer and a reflectometer in one system. This combination allows zero degree reflectometry for fast thin film analysis and the unambiguous thickness determination for transparent films extending the measurable thickness range to 25 µm with the Sub-Angstrom precision of a laser ellipsometer. Details for the CER Ellipsometer SE 500adv here!

SE400adv_x-y-tisch

  • Microspot
  • Mapping stages (up to 200 mm)
  • Autofocus
  • Reflectometer
  • Liquid Cell for in situ measurement

SE401_insitu_550px

The in situ laser ellipsometer SE 401 is designed for monitoring in situ deposition and etch processes and to measure thickness and refractive index of layers under vacuum. Details for SE 401 here!