PESM 2023 is the 13th event in a series devoted to plasma etch and strip processes for micro-, nano- and biotechnologies. This workshop will be held in June 2023 in Grenoble (France).

The objective of the workshop is to provide a forum for open discussions between science and technology. It is not only dedicated to scientists, process engineers and Ph-D students, but also to industrial partners in the field of dry etching, including plasma processing but also other vacuum-based removal techniques (ion beam, neutral beam, gaseous thermal etching, etc…). Topics may include both fundamental and applied research highlights, as well as issues related to the introduction of new technologies into manufacturing.

PESM 2023 will focus on plasma etching and cleaning challenges : in III-V and III-N semi-conductor processing for power or photovoltaics applications, in dielectrics/metals processing for advanced memory technologies (OXRAM, PCRAM, MRAM, FeRAM,..), in More than More applications (MEMS, photonics, Imager..). It will be also dedicated to emerging plasma etching concepts and technology (ALE, cryogeny..) and the fundamental aspects of plasmas (new plasma sources, Diagnostics, Modeling …)
This year SENTECH has a stand as PESM where our team will be available to discuss any application challenges and answer any questions about SENTECH Plasma process technology or thin film metrology tools.
Please click here to learn more about the show or to register.