Spectroscopic Reflectometry

Spectroscopic ellipsometry (SE) is a highly precise, non-destructive optical technique used to characterise thin films, surfaces, and layered materials. By measuring the change in polarisation of light as it reflects from a sample, SE provides critical information about film thickness, refractive index, absorption coefficient, and optical constants across a wide spectral range. Unlike other analytical methods, spectroscopic ellipsometry delivers sub-nanometer accuracy without requiring direct contact with the material, making it indispensable in modern nanotechnology and microtechnology research.

In semiconductor research, where device performance depends on atomic-scale precision, spectroscopic ellipsometry plays a vital role. From silicon wafers to advanced compound semiconductors, SE enables researchers and engineers to monitor thin film growth, optimise deposition processes, and detect even the slightest variations in film uniformity. This is especially important for applications such as gate dielectrics, multilayer stacks, and emerging 2D materials, where accurate characterisation directly impacts device reliability and efficiency.

The strength of spectroscopic ellipsometry lies in its versatility. It can be applied to metals, semiconductors, dielectrics, and organic layers, making it a universal tool in microelectronics, photovoltaics, and nanofabrication. For industries driving Moore’s Law and beyond, SE ensures that materials and processes meet the demanding requirements of ever-shrinking devices.

As semiconductor technology continues to scale down to the nanometer regime, non-invasive measurement techniques become increasingly critical. Spectroscopic ellipsometry not only provides unparalleled accuracy but also offers rapid, repeatable measurements suitable for both research and industrial environments. Its ability to deliver real-time feedback accelerates development cycles and improves yield in semiconductor manufacturing.

Spectroscopic ellipsometry is essential to the progress of nano- and microtechnology. By enabling precise, contact-free thin film characterisation, it supports the innovation and quality control needed for next-generation semiconductor devices. The SENTECH spectroscopic ellipsometry range is trusted worldwide for its precision, flexibility, and ease of use. Designed for both cutting-edge research and small-scale production, SENTECH systems deliver accurate thin film measurements with intuitive software and robust hardware. Their modular design allows seamless adaptation to diverse applications, from semiconductors to nanomaterials. SENTECH is the reliable choice for high-quality, reproducible results.