Spectroscopic Reflectometry
What Is Spectroscopic Reflectometry?
Understanding Spectroscopic Reflectometry
Spectroscopic reflectometry is a non-destructive optical metrology technique used for thin film characterisation and wafer analysis. It measures the reflected light intensity across a broad wavelength range to determine film thickness, refractive index (n), and extinction coefficient (k). Unlike single-wavelength methods, spectroscopic reflectometry analyses full spectral data, allowing precise modelling of multilayer thin films and complex material stacks.
Learn more about the full range of SENTECH spectroscopic reflectometers, or scroll on for more information about how and where spectroscopic reflectometry is the perfect solution for thin film characterisation.
How and Where Spectroscopic Reflectometry Works
In spectroscopic reflectometry, light reflects from multiple interfaces within a thin film structure. The resulting interference pattern varies with wavelength and film thickness, creating a unique reflectance spectrum. By comparing this measured spectrum to theoretical models, spectroscopic reflectometry systems extract detailed optical and physical parameters of each layer.
SENTECH systems are designed for research laboratories, cleanroom environments, and semiconductor fabs, offering automated measurement routines and robust data modelling for wafer characterisation and process monitoring.
Why Spectroscopic Reflectometry Is Important in Semiconductor Research
Spectroscopic reflectometry plays a critical role in semiconductor process control and R&D. It enables precise, non-contact monitoring of ultra-thin films used in photoresists, dielectrics, and gate oxides. As device geometries continue to shrink, spectroscopic reflectometry ensures layer uniformity, thickness accuracy, and yield optimisation. This makes spectroscopic reflectometry a cornerstone of thin film metrology across various industries, including semiconductors, photonics, and materials research.
SENTECH reflectometry solutions, RM 1000 and RM 2000, deliver rapid, in-line, and model-based measurements that enhance quality assurance and accelerate next-generation semiconductor innovation, making them indispensable tools in modern wafer metrology and nanotechnology development. Our tools combine high-stability broadband sources, sensitive detectors, and advanced optical modelling software to provide accurate and repeatable measurements. Find out more about our RM 1000 QC, for automated, tabletop QC in your research lab.
