Laser Ellipsometer for in-situ measurement – SE 401adv

In-situ sub-angstrom precision measurement of ultra-thin, single-layer films.

Key features & benefits

Sub-Angstrom accuracy

The stabilised HeNe laser guarantees a precision of 0.1 Å for thin film thickness measurement of ultra-thin single layers.

High speed

The SENTECH SE 401adv laser ellipsometer measurement speed enables users to monitor single film growth and endpoint detection or to map samples for homogeneity.

High stability and reproducibility of the measured ellipsometric angles

The in-situ ellipsometer SE 401adv allows monitoring growth and etch processes in different ambientes at the surface of reflecting samples. It measures the time dependence of the ellipsometric angles Ψ and Δ and calculates in real-time thickness and refractive index

SE 401adv is adaptable to your needs by mapping up to 200 mm, liquid cells for in situ measurement, video camera, autofocus, simulation software, and certified standard wafer.

Flexibility and modularity

 The SENTECH SE 401adv in-situ laser ellipsometer can be utilised to characterise single films and substrates from selectable, application-specific angles of incidence. The auto-collimating telescope ensures precise measurement on most absorbing or transparent substrates with a flat, reflective surface. The fully integrated support of multiple angle measurements (40 ° – 90 ° in steps of 5 °) can be used for determining the thickness, refractive index, and extinction coefficient of layer stacks.

The SENTECH SE 401adv is the laser ellipsometer for thickness measurement of ultra-thin single films. The options of the SENTECH SE 401adv in-situ laser ellipsometer support applications in microelectronics, photovoltaics, data storage, display technology, life science, metal processing, and many more leading-edge technologies.

The SENTECH SE 401adv is adaptable to your needs by mapping up to 200 mm, liquid cells for in situ measurement, video camera, autofocus, simulation software, and certified standard wafer.

Find out more about why the SENTECH SI 400adv multiple angle laser ellipsometer is also the right choice for ex-situ use.

Configurations:

  • In-situ laser ellipsometer with a time resolution of 40 ms.
  • HeNe-laser for high stability and reproducibility
  • Kit for easily mounting the sender and receiver modules to the flanges of a process chamber
  • Table top equipment
  • HeNe-laser for high stability and reproducibility
  • Highly precise sample alignment
  • Manual goniometer with superior performance and angle accuracy

The options of the SE 400adv support applications in many industries:

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