Key features & benefits
Automated laser endpoint detection for etching and deposition processes
In-situ measurements using the SENTECH SLI Laser Interferometer are particularly suitable for monitoring the endpoint detection for transparent layers, endpoint detection for interfaces of transparent layers and endpoint detection for etching opaque films and stopping on an interface.
Multi-layer mode sequential endpoint recipes
Multi-endpoint recipes include multiple conditions for EPDs, which are executed sequentially thus enabling a change of plasma process parameters during a multi-layer etch process, according to individual film properties.
Fully integrated endpoint detection with The SENTECH operating Software SIA
The SENTECH SLI Laser Interferometer can be fully integrated with the SENTECH operating software, SIA, for specific endpoint detection recipes that directly parameterise endpoint monitoring by using easy, industry-standard command lines.
The SENTECH SLI laser interferometer endpoint monitor for the plasma systems of SENTECH Instruments works with a focused beam of coherent laser light. The laser beam passes through the top viewport of the plasma system and is reflected by the sample. The reflected light hits the detector and the intensity is measured.
Flexibility and modularity
The SENTECH SLI Laser Interferometer in-situ optical metrology endpoint monitor that can be used with the entire range of SENTECH plasma etch and deposition processing systems, works with a focused beam of coherent laser light passing through the top viewport of the plasma system and is then reflected by the sample to accurately measure intensity.
A separate illumination (LED) and a CCD camera are used for the observation of the sample and adjustment of the laser spot. The whole endpoint monitor is moved by an automatic x y-stage allowing easy spot adjustment using the SENTECH SIA operating software system.
Automated in-situ measurements using the SENTECH SLI Laser Interferometer are ideal for monitoring the layer thickness while etching or growing a transparent layer or layered structures.
