Key features & benefits
Fast process development and optimisation
Atomic layer processes are quickly and easily developed and optimised using single atomic layer deposition (ALD) or atomic layer etching (ALE) cycles. The SENTECH AL Real Time Monitor reveals adsorption and desorption with ultra-high, 40 ms time resolution. Development time of processes, substrates, precursors, and gasses are saved.
Saving precursor
ALD processing becomes more efficient after optimisation with the SENTECH AL Real Time Monitor. Precursor and processing time are saved.
Precursor control
When the precursor supply is running out, this is immediately indicated by a change in growth per cycle detected by the SENTECH AL Real Time Monitor.
The SENTECH AL Real Time Monitor for fast process development is a proven, optical diagnostic tool, allowing ultra-high resolution of single ALD and ALE cycles. The main applications of the SENTECH AL Realtime Monitor are analysis of film properties (growth rate, thickness, refractive index, as well as etch rate) without breaking vacuum, developing new processes in a short time, and studying reaction mechanisms during ALD and ALE cycles in real-time.
Flexibility and modularity
The innovative SENTECH AL Real Time Monitor is specially designed for fast and efficient process development and optimisation with SENTECH PEALD and ALD systems.
One software enables easy operation of SENTECH PEALD systems, SENTECH ALE systems, and SENTECH AL Real Time Monitor.
A large material library for optical constants supports the development of new processes and can be extended by ex-situ characterisation.
The SENTECH AL Real Time Monitor is fully integrated into the SENTECH SIA operating software, ensuring easy operation.
Real-time resolution
