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Plasma Etching

Discover the SENTECH modular and flexible ICP-RIE processing systems for low-damage, high-rate, and high-selectivity inductively coupled plasma (ICP) etching.
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Plasma Etching

What are your plasma etching application challenges?

Plasma etching with SENTECH systems

Our low-damage plasma etching capabilites deliver high precision etching while preserving inherent properties that enable cutting-edge research and technological innovation.

SENTECH SI 500 ICP-RIE Plasma Etch System

ICP-RIE Plasma Etch System – SI 500

The SENTECH SI 500 ICP-RIE high-end plasma etch system uses an inductively coupled plasma (ICP) […]
SENTECH SI 500 C

Cryogenic Etching – ICP-RIE Plasma Etch System – SI 500 C

Cryogenic etching using the SI 500 C represents the leading edge for inductively coupled plasma […]
SENTECH Etchlab 200

RIE Plasma Etching Open Lid System – Etchlab 200

The RIE plasma etching system Etchlab 200 features the benefits of cost-effective direct loading. […]
SI 591 Compact

RIE Plasma Etching System with Small Footprint – SI 591 compact

The SENTECH SI 591 compact RIE Plasma Etch system with load lock is a compact […]
SENTECH SI 500 CCP

RIE Plasma Etch System with He Backside Cooling – SI 500 CCP

A conductively coupled plasma etch tool with Helium backside cooling for processing of substrates in […]

Plasma Process Technology

PECVD
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Atomic Layer Deposition

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News

Project Mexiquo Team

Revolutionising Photonics: A Path to Affordable, Quantum-Enhanced Optical Components

Learn more about “Projekt MEXSIQUO”
OptiRefS project

OptiRefS Project

Learn more about the OptiRefS project
Delegates from the 2024 SENTECH Thin Film Metrology Seminar and Workshop

The SENTECH Thin Film Metrology Seminar and Workshop 2024

Read about our cutting-edge thin film metrology seminar and workshop!
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Successful Characterisation of Dielectric Layers on SiC for Next-Gen Semiconductor Applications

Explore our latest research and request the full application note.
The RUB Cluster from SENTECH

Wafer-level integration challenges of ALD for 2D materials

Find out about the collaboration between SENTECH and the Ruhr-Universität Bochum (RUB).
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Analysing the earth’s heat balance to better understand global warming

The European Space Agency's satellite mission planned for 2027.