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Plasma Etching

Discover the SENTECH modular and flexible ICP-RIE processing systems for low-damage, high-rate, and high-selectivity inductively coupled plasma (ICP) etching.
Dekoratives Bild
Dekoratives Bild

Plasma Etching

What are your plasma etching application challenges?

Plasma etching with SENTECH systems

Our low-damage plasma etching capabilites deliver high precision etching while preserving inherent properties that enable cutting-edge research and technological innovation.

SENTECH SI 500 ICP-RIE Plasma Etch System

ICP-RIE Plasma Etch System – SI 500

The SENTECH SI 500 ICP-RIE high-end plasma etch system uses an inductively coupled plasma (ICP) […]
SENTECH SI 500 C

Cryogenic Etching – ICP-RIE Plasma Etch System – SI 500 C

Cryogenic etching using the SI 500 C represents the leading edge for inductively coupled plasma […]
SENTECH Etchlab 200

RIE Plasma Etching Open Lid System – Etchlab 200

The RIE plasma etching system Etchlab 200 features the benefits of cost-effective direct loading. […]
SI 591 Compact

RIE Plasma Etching System with Small Footprint – SI 591 compact

The SENTECH SI 591 compact RIE Plasma Etch system with load lock is a compact […]
SENTECH SI 500 CCP

RIE Plasma Etch System with He Backside Cooling – SI 500 CCP

A conductively coupled plasma etch tool with Helium backside cooling for processing of substrates in […]

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