SENTECH at EuroNanoLab Dry-Etch Expert Group Workshop
In association with Technische Universität Ilmenau, Zentrum für Mikro- und Nanotechnologien (ZMN)
Ilmenau, Germany, 11 to 12 November
SENTECH is proud to participate in the EuroNanoLab Dry-Etch Expert Group Workshop 2025, hosted in Ilmenau, Germany. Participants can look forward to an interesting and insightful program, bringing together leading specialists in dry etching and plasma processing. SENTECH application experts will host interactive practical sessions, including:
- Latest advances on SENTECH dry etch technologies for high-end semiconductor applications, covering diamond, SiC, Bosch, ALE, compound semiconductor and dielectrics.
- In-situ metrology for process monitoring and endpoint detection (EPD), using ellipsometry, reflectometry, and optical emission spectroscopy (OES) for fast process development of ALE and ALD, etch stop of metal etching, OES for chamber clean and full wafer EPD.
- Optimal plasma sources for low-damage AL precise processing, Planar Triple Spiral Antenna (PTSA) ICP source and True Remote CCP source”
- Open discussion on collaboration opportunities.
We look forward to meeting participants from across the EuroNanoLab network and exchanging knowledge on the latest innovations in dry etching and plasma processing.
To see the full agenda, or to find out more about the event and register, please click here.
