SILAYO - Plasma Enhanced Atomic Layer Deposition System

Plasma-Enhanced-ALD-System_SILAYO

Benefits of SILAYO:

PEALD for best thin film uniformity < 1 %

The SENTECH proprietary Planar Triple Spiral Antenna (PTSA) is dedicated to deposition of optical coatings on 3D-objects.

Samples up to 330 mm diameter & 100 mm height

SILAYO enables a homogeneous processing up to sizes of 330 mm in diameter and a vertical dimension up to 100 mm.

Stress control using RF bias

Optional RF biasing equipment allowing the modification of the layer properties (e.g. stress and refractive index).

SILAYO by SENTECH is a Plasma Enhanced Atomic Layer Deposition System. It features optical coating in the nanometer-scale. This requires a high level of accuracy regarding layer properties such as thickness, composition, conformality and stress control.

SILAYO is designed for depositing materials on large and 3D-shaped substrates, especially for optical coatings with a high demand on layer performance such as:

  • High precision in thickness and composition control
  • Smooth surfaces and sharp interfaces
  • Stress control, especially for high thickness multilayers
  • High uniformity and conformality on 3D shapes
  • Reduced deposition temperatures for gentle processing

SILAYO extends SENTECH ALD and PEALD product portfolio to deposition on 330 mm substrates and 3D substrates. In order to ensure an excellent uniformity and conformality in layer-thickness, atomic layer deposition is used for depositing optical thin films applied as e.g. anti-reflective coatings or optical filter systems. SILAYO uses the advantages of the Planar Triple Spiral Antenna (PTSA) ICP source in PEALD processing.

The system is controlled by advanced SENTECH control software using remote field bus technology, and a very user friendly interface. It can optionally be equipped with proprietary  Real Time Monitor for in situ monitoring.