Berlin, 30.03.2015



During SEMICON China 2015, the Chinese SENTECH user community and guests met at the representative SENTECH stand and at the SENTECH Plasma Seminar. The introduction of new SENTECH plasma etch and deposition products to the Chinese market and networking were the highlights of the seminar.

The new SIPAR System combining SENTECHs PECVD and ALD in one reactor was introduced as latest development of the plasma product portfolio for R&D. The SIPAR System enables automatic depositing multilayer stacks composed of plasma enhanced chemical vapour deposition (PECVD) and atomic layer deposition (ALD) layers. PECVD layers feature high deposition rates and ALD layers provide high conformity and homogeneity. SIPAR is designed for low damage deposition of multilayers at low temperature <100°C using the SENTECH proprietary PTSA inductively coupled plasma source.

The SENDURO® MEMS is SENTECH answer to the variety of measurement tasks in MEMS and Sensor production ranging from membranes, air gaps, dielectrics, semiconductors and metals to complex layer stacks. The SENDURO® MEMS provides a cost-effective metrology solution for MEMS, sensors, OLED, and LED application.

The SIPAR and SENDURO® MEMS were well received at the Seminar and contributed to the success of the SEMICON China. For more information on the SIPAR and SENDURO® MEMS, please contact us!