Optical Reference Data for Technological Layer Systems for novel materials for thin films project (OPTIRefS)

SENTECH Instruments GmbH, Technische Universität Berlin (TU B), Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (HZB), and Physikalisch Technische Bundesanstalt (PTB) have launched a joint project, funded by Investitionsbank Berlin as part of the ProFIT program funding.

In the Optical Reference Data for Technological Layer Systems for novel materials for thin films project (OptiRefS) project, novel reference materials for ellipsometry on thin film materials in the wavelength range below 200 nm are to be developed over the next three years. A method for determining traceable optical data with a well-founded uncertainty budget will be developed and validated.

The vacuum ultraviolet (VUV) ellipsometer at the Metrology Light Source (MLS), will adhere to a metrological standard, a method for determining traceable optical data including refractive index, absorption coefficient, and layer thicknesses, going forward. Methods tested on substrates with a defined surface structure will be transferred to technological thin film systems. Chemically-passivated silicon substrates with variable step density, graphene layers on silicon substrates will be produced by HZB and TU B for this purpose. SENTECH will produce Al2O3/silicon layer structures using Atomic Layer Deposition (ALD). SENTECH's goal is to provide process and reference samples that allow ISO9001-compliant certifications for refractive indices and layer thicknesses for applications in the spectral ranges from ultraviolet to vacuum ultraviolet for the first time in Germany.