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Plasma_Seminar_2023_Main article

Reserve your space at this year’s SENTECH Plasma Process Technology Seminar on 25 April 2024, in Berlin-Adlershof.
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SENTECH Thin Film Metrology Seminar 2023-200 x134

The SENTECH Thin Film Metrology Seminar and Workshop took place on 29 – 30 November 2023 in Berlin-Adlershof. Read the full article to find out more about the seminar and all of the topics from this year's event.  →read more

The RUB Cluster from SENTECH copyright ForLab PICTIDES _ Ruhr University Bochum_Thumbnail

Find out about the collaboration between SENTECH and “Research Laboratory Microelectronics Bochum for 2D Electronic Systems” (ForLab PICT2DES) at Ruhr-Universität Bochum (RUB) project to learn more about the atomic layer deposition (ALD) for 2D materials. Request your copy of the case study here. →read more

ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

Upcoming Events:

Headbanner_SEMICON China_2024

Headbanner_Plasma Seminar_Berlin_2024

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Fax: +49 (0)30 63 92 55 22
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Chinese sales office:
SENTECH China


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