What's New?

Plasma-Seminar_2019_Teaser

SENTECH veranstaltet am 28.03.2019 ein anwendungsorientiertes Seminar über „Plasma Prozess Technologie“ in den Räumen von SENTECH Instruments in Berlin. Themen sind das schädigungsarme Ätzen und Beschichten in der Prozessierung von Bauelementen, 3D-konforme Abscheidung dünnster Schichten und industrielle Anwendungen in der Plasma Prozess Technologie. →read more

Thin-Film-anaylsis-seminar-2019-by-SENTECH

A SENTECH workshop on Ellipsometry took place in January 9-11, 2019 in Beijing, China. There is an large interest of Chinese scientists and users in SENTECH innovative thin film measurement tools. That’s why SENTECH is organizing application-oriented workshops and seminars in China frequently. This is to update already existing users as well as prospective customers on new metrology applications and their possibilities of use. →read more

ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

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Instruments GmbH

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12489 Berlin
Germany

Phone: +49 (0)30 63 92 55 20
Fax: +49 (0)30 63 92 55 22
Email: info@sentech.de

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German sales office:
SENTECH GmbH

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Chinese sales office:
SENTECH China


Worldwide sales partners:
→ SENTECH Distributor NetworklinkMG