The ALD 2019 is the 19th International Conference on Atomic Layer Deposition and will take place in Bellevue, Washington, USA in July 21-24, 2019 at the Hyatt Regency Bellevue in Bellevue, Washington (East Seattle).The three-day meeting is dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.

SENTECH is proud to be part of this growing and innovative event as bronze sponsor. We will show our latest ALD Developments, especially the demonstration of our new tool SILAYO. SENTECH reliable PEALD features conformal and homogeneous optical coatings on large 3D objects and on batches of small substrates.

Your are kindly invited to visit SENTECH at table no. 311! We are looking forward to see you!