Back to overview

ALD 2018
Jul 29, 2018 - Aug 01, 2018
Seoul, South Korea

The AVS 18th International Conference on Atomic Layer Deposition (ALD 2018) will take place Sunday, July 29-Wednesday, August 1, 2018, at the Songdo Convensia in Incheon, South Korea.

The three-day meeting is dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  

Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists.  

SENTECH is going to present its latest ALD applications and is honored to be part of this world-renowned conference once again.

You are kindly invited to visit SENTECH at table no. 45.