For the third time the International Conference on ALD Applications & 2018 China ALD Conference will be held in Shenzhen, China, from October 14 to 17, 2018. This is a four-day meeting, dedicated to the fundamentals and applications of Atomic Layer Deposition (ALD) technology in various fields. This conference will feature plenary sessions, oral sessions, poster sessions and industrial exhibitions.

SENTECH is sponsor of this important ALD event in China. We are proud to present our various ALD products to the selected audience of the International Conference on ALD Applications & 2018 China ALD Conference.

The focus will be on the new SENTECH SILAYO Plasma Enhanced Atomic Layer Deposition System. This unique system features best thin film uniformity <1% and will surely excite the visitors of C ALD this year. We are looking forward to meet you in Shenzhen!