Product overview
Ellipsometers and Reflectometers
Research and development
Industrial quality and in-line control
Research and development
- Advanced Film Thickness Probe
- Reflectometer for materials analysis
- Laser ellipsometer for ultimate precision
- Spectroscopic ellipsometer for largest spectral range
Industrial quality and in-line control
- Large area measurement systems
- Spectroscopic ellipsometer for automated, routine measurements
- In-line process control
Photovoltaics
- Laser ellipsometer and reflectometer for the measurement of antireflective coatings on silicon solar cells
- Horizontal and vertical mapping systems for large area thin film solar cells
- Spectroscopic ellipsometer for the analysis of TCO films (SnO2, AZO, ITO)
- Spectroscopic ellipsometers and reflectometers for the analysis of absorber films (a-Si, µ-Si, CdTe, CdS, CIS, CIGSE)
Plasma Deposition and Etching
Cluster configurations
Plasma deposition (PECVD, ICPECVD)
- PECVD deposition systems
- Optical monitoring
Plasma etching (ICP, RIE)
- RIE etcher with and without loadlock
- ICP etcher
- Optical process monitoring
Cluster configurations
- Fully automated ICP and RIE etchers for compound semiconductor processing
- Multiple reactor systems with cassette to cassette loading
- Large area sample processing for masks and micro-optics