Overview
SENTECH’s tools and equipment are designed for the use in research, development and production. Accuracy, operation speed, flexibility and ease of use are key properties of all our offered equipment.
SENTECH’s tools for reflectometry and ellipsometry covers all applications of measuring thickness, refractive index, absorption index and other optical assessable material properties like composition, roughness, crystal structure, anisotropy, carrier concentration of single films and layer stacks.
SENTECH’s equipment for plasma process technology fulfils the requirements of leading edge plasma etch and plasma deposition applications. Low damage and low thermal budget processing are outstanding features of our applications.
SENTECH’s tools for reflectometry and ellipsometry covers all applications of measuring thickness, refractive index, absorption index and other optical assessable material properties like composition, roughness, crystal structure, anisotropy, carrier concentration of single films and layer stacks.
SENTECH’s equipment for plasma process technology fulfils the requirements of leading edge plasma etch and plasma deposition applications. Low damage and low thermal budget processing are outstanding features of our applications.