Spectroscopic ellipsometry software SpectraRay/4
Measurement parameters may be simulated as function of wavelength, photon energy, reciprocal centimeter, angle of incidence, time, temperature, thin film thickness measurement, and other parametersSimulating:
Ellipsometric parameter Ψ, Δ, tan(Ψ), cos(Δ)
Reflectance R, Rp, Rs
n, k, ne, no, ke, ko Material properties ε1, ε2 MSE value Color values .
The mapping option of our spectroscopic ellipsometry
Multilayer analysis by SpectraRay/4:
Thickness of Si3N4 / SiO2 / Si3N4 [nm] features predefined or user defined patterns, extensive statistics, and graphical display of data as
- Setting measurement parameters
Angle of incidence:
Single or multiple angle measurement Wavelength range Measurement mode:
(Ψ, Δ), (S1, S2), T, Rp, Rs Mapping options and starting thin film thickness measurement
- Building a model by drag and drop from a materials library or from already existing dispersion models
- Defining and varying parameters to fit the calculated spectra to the measured spectra
- Interactively improving the model for best figure of merit
- Reporting the results as a word document by selecting from predefined or customized templates
- Saving all experimental data, the protocol, and comments in one experiment file
SpectraRay/4, the SENTECH proprietary spectroscopic ellipsometry software, includes data acquisition, modeling, fitting, and extended reporting of ellipsometric, reflection, and transmission data. It supports variable angle, multi-experiment, and combined photometric measurements. SpectraRay/4 includes a huge library of materials data based on SENTECH thickness measurements and literature data as well. The large number of dispersion models
Effective medium and index gradient
Uniaxial & biaxial anisotropic
and others allows modeling of nearly any type of material.
SpectraRay/4 provides a user-friendly workflow oriented interface to operate SENTECH spectroscopic ellipsometry tools and a comprehensive set of tools to model, fit, and represent ellipsometric data. The user interface incorporates a recipe oriented operation for operators and an advanced mode for interactive measurement and modeling.
SpectraRay/4 features uniaxial and biaxial anisotropic material measurements, thin film thickness measurement, and the measurement of layers. The software treats sample effects like depolarization, non-uniformity, scattering (Mueller-matrix), and backside reflection.
SpectraRay/4 includes all utilities of general spectroscopic ellipsometry software package for data import and export (ASCII included), file management, arithmetic manipulations of spectra, display, printing, and reporting (in Word file format *.doc). The scripting capability makes it very flexible to automate routine measurements, tailor it for demanding applications, and control third party hardware like sensors, heating stage, sample cell or cryostat.