SI 500 PPD

SI 500 PPD Parallel Plate PECVD Deposition System
SI 500 PPD
 
System configurations:
  • Power supply 13.56 MHz, 600 W
  • Driven electrode with integrated shower head and dark space shield
  • 6 MFC controlled gas lines (SiH4, NH3, N2O, O2, Ar, CF4)
  • Vacuum load lock with pick-and-place
  • High speed pumping system with gas flow independent pressure control
  • Insulated externaly grounded electrode for substrates of up to 8" diameter (sample pieces on 4" carriers)
  • substrate temperature 20ºC up to 350ºC
  • Remote field controller (RFC)
  • Windows XP operation Software
  • SENTECH’s Plasma process systems operating software
 
Options:
  • Cassette to cassette handling
  • Through-the-wall installation
  • In-situ ellipsometry (SE 401, SE 801)
 

Please contact us for more information.