SENTECH Plasma Seminar 2016
SENTECH has organized a seminar on “Plasma Process Technology” held at SENTECH Instruments GmbH in Berlin on April 07, 2016.
(Participants of the SENTECH Plasma Seminar 2016)
The seminar was fully booked and more than 50 process engineers, scientists and application specialists took part. This year the presentations of the seminar centered on etching of silicon nanowires, etching of diamond nano-structures, and etching of fused silica, glass, and technical glass as well as silicon.
The advanced deposition of thin films by ICPECVD, ALD and PEALD was reported. SENTECH application specialist Dr Wang presented on TEOS based SiO2 deposition as an alternative to silane based processing.
Although the seminar was held in German international guests from China, Bulgaria, Austria, Switzerland, Turkey, Iran, and India gave the seminar its international touch.
SENTECH Seminar participants were invited to visit SENTECH application laboratories and production facilities.
SENTECH is proud of the rewarding feedback of the attendees. The above photo was taken in front of the SENTECH headquarter in Berlin Adlershof showing the gathered participants of the seminar on Plasma Process Technology.