Overview
SENTECH’s ellipsometers, reflectometers, plasma etchers and plasma deposition systems are designed for use in research, development and production. Accuracy, operation speed, flexibility and ease of use are key properties of all our offered equipment.
SENTECH’s ellipsometers (laser ellipsometer, spectroscopic ellipsometer) and reflectometers cover all applications of measuring thickness, refractive index, absorption index and other optical assessable material properties like composition, roughness, crystal structure, anisotropy, carrier concentration of single films and layer stacks.
SENTECH’s plasma etchers and plasma deposition systems perform to the standards of leading edge plasma etch and plasma deposition applications. Low damage and low thermal budget processing are predominantly superior features of our applications.
SENTECH’s ellipsometers (laser ellipsometer, spectroscopic ellipsometer) and reflectometers cover all applications of measuring thickness, refractive index, absorption index and other optical assessable material properties like composition, roughness, crystal structure, anisotropy, carrier concentration of single films and layer stacks.
SENTECH’s plasma etchers and plasma deposition systems perform to the standards of leading edge plasma etch and plasma deposition applications. Low damage and low thermal budget processing are predominantly superior features of our applications.