Ellipsometry, Reflectometry

SENTECH’s tools for UV-VIS-NIR reflectometry, laser ellipsometry and DUV-VIS-NIR-MIR spectroscopic ellipsometry are applied to measure:
  • Film thickness
  • Thickness of each film in a layer stack
  • Refractive index
  • Absorption index (extinction coefficient)
  • Anisotropy (uniaxial, biaxial) of materials, films and layer stacks
  • Reflectance
  • Transmittance
  • Materials composition, band gap
  • Alloys
  • Phase and state of solids
  • Crystal damage
  • Porosity
  • Surface roughness
  • Interface roughness
  • Index gradient
  • Chemical composition
  • Charge carrier concentration, mobility and conductivity
  • Depolarization
  • Uniformity of films and layer stacks
  • Film thickness and refractive index of AR coatings on solar silicon
  • Film growth rate

List of materials data available