In-situ

Ellipsometric and reflectometric measurements are typical used to monitor the growth of films in MBE, ALD, and other vacuum deposition systems (e.g. PECVD, Sputter coating). Typical applications are growth rate measurement, endpoint detection and growth process analysis.
 
SENresearch SE 801SENresearch in-situ spectroscopic ellipsometer SE 801
  • Vertical single port attachment of spectroscopic ellipsometer on a deposition system for large glass substrates
  • In-line monitoring of deposition process
 
SE 801SENresearch in-situ spectroscopic ellipsometer SE 801
  • Spectral range: 280 nm – 850 nm
  • Fast and very accurate kinetic measurements

Measurement of growth rate and growth processes in:
  • MBE ( e.g semiconductors)
  • ALD (e.g. high k, metals and metal nitride materials)
  • Sputtering and deposition systems for dielectric, organic and metallic films
 

Laser ellipsometer SE 401adv

  • HeNe laser
  • Cost-effective and very accurate method for monitoring of single film growth, measurement of refractive index and endpoint detection
 
FTPadvancedFilm Thickness Probe FTPadvanced
  • Low budget solution for film thickness measurement and endpoint detection.